Posted in | Sputtering Equipment

Impel PVD Multi-Chamber Deposition System from Semicore

Semicore’s Impel PVD systems utilize a cost-effective modular design that is easily configured to suit a variety of thin film deposition applications, typically for R&D or small batch production. Up to three process chambers, each uniquely configured for a specific application, share a central load lock for handling various substrate shapes and sizes up to 200mm. Integrated computer control with recipe based operation, tolerance checking and data logging is featured. A comprehensive list of standard options is available to configure the Impel PVD system to suit your specific requirements. Bulkhead or ballroom installation is available.

Other Equipment by this Supplier