The OAI Model 8000 Mask Aligner is an advanced, high-performance optical front and backside mask aligner and exposure tool that delivers ultra precise, front and back side, sub-micron alignment and resolution for the most demanding bulk and surface MEMS applications.
Model 8000 is capable of performing level-to-level alignment and double-sided lithography. The flexible design allows printing on various substrates (round or square) up to 300mm. The exposure system is compatible with photo resist in Near, Mid or Deep UV range.
This versatile mask aligner system is designed for double-sided lithography and is engineered for a wide variety of process applications. With its proven, modular design, it delivers the scalability required to accommodate changing process parameters. This automated mask aligner system is designed primarily as a full production tool, but is available in a manual configuration for which it is well suited for low volume production, short-run engineering, or R&D applications. The tool may be used in proximity, contact or vacuum modes. Other notable features include auto pre-aligner, intensity controlling power supply system and, dual zoom CCD TV exposure lamp power up to 5000W and a low-maintenance design.