Electron beam lithography
For two decades Raith instruments are extensively used within the nano fabrication and nano engineering community. Raith made conventional electron beam lithography accessible to a broad research community world wide.
With sub 10 nm linewidth guaranteed, Raith electron beam lithography systems provide state of the art performance.
As important part for the success, Raith is driving a continuous product and application innovation program: Beyond established nano lithography capabilities of electron beam or ion beam lithography systems, the core instruments are extended to versatile nano engineering solutions, that ideally suit the multi application oriented community.