Jun 18 2015
InVisage Technologies Inc., the leading developer of quantum dot camera sensors, opened its first high-volume, fully automated QuantumFilm sensor manufacturing facility in Hsinchu Science Park, Taiwan.
As part of the opening ceremony in Taiwan, InVisage executives joined representatives from Taiwan Semiconductor Manufacturing Company, Ltd. (TSMC), Hsinchu Science Park, and additional supply chain partners to unveil the new facility with a formal ribbon cutting. A factory tour for guests followed. The new factory, named QFAB3, brings next-generation nanoscale manufacturing to Taiwan as InVisage prepares to introduce QuantumFilm technology later this year.
QuantumFilm is an extremely light-sensitive layer of quantum dots that replaces the conventional silicon photodiode in digital camera sensors and provides improved dynamic range, greater performance in low light, and global shutter capabilities. More details are preserved in both bright and dark areas, and fast motion can be captured with less distortion. The material is customizable to allow for dynamic adjustment of sensitivity and resolution, and can be optimized for better performance at wavelengths ranging from visible to infrared.
“We chose to establish our high-volume manufacturing in Taiwan because of the vitality of the semiconductor ecosystem here, and in particular because of our partnership with TSMC,” said InVisage’s CEO, Jess Lee. TSMC is the world's largest dedicated independent semiconductor foundry, located in close proximity to QFAB3.
Lee added, “With our new facility and staff, we are able to source and install custom, state-of-the-art fabrication equipment and are now well positioned to ramp up QuantumFilm production.”
The manufacturing facility features unprecedented sub-5 nanometer process geometry within an ISO Class 10 cleanroom. It is designed to support a wide range of products, from mobile phones to high-end cameras as well as drones and other IoT devices that require high performance cameras.
InVisage’s use of quantum dots eliminates the need for finely patterned lithography to achieve high performance and sub 5-nm scale. This has a multiplier effect in terms of product performance, value, and output. As a result, InVisage’s new facility is compact and more efficient than facilities manufacturing competing technologies.
Product wafers are first manufactured by nearby TSMC and then transferred to InVisage’s facility for QuantumFilm deposition. The deposition itself is performed by a single, custom tool that combines spin-coating and CVD deposition technologies into one machine for the first time. This combination allows the deposition process to be both modular and fully automated. This is the first of many facilities to come as InVisage increases its capacity and QuantumFilm technology becomes the new standard for cameras.
For more information on the QFAB3 facility, InVisage, or its groundbreaking QuantumFilm technology, visit www.invisage.com.
Source: http://www.invisage.com/