Posted in | Chemical Vapor Deposition (CVD) Instruments

Annealsys MC100 Cold Wall MOCVD Reactor

Need more information?

Let us help you with your inquiries, brochures and pricing requirements

ANNEALSYS logo.

The Annealsys MC100 is a cold wall MOCVD reactor especially developed to meet the requirements of research and development units.

  • The Annealsys MC100 is a cold wall MOCVD reactor especially developed to meet the requirements of research and development units.
  • The MC100 allows doing heteroepitaxy of oxides on single crystals wafers (such as YBCO/LAO, STO/MgO, MxOy/LAO,…) by MOCVD using a wide
    range of solid and liquid organometallic volatile precursors using Direct Liquid Injection technology.
  • The MC100 system can be provided with various vaporization systems and vacuum equipment depending on the application.
  • Pulse pressure CVD capability

Other Equipment

Terms

While we only use edited and approved content for Azthena answers, it may on occasions provide incorrect responses. Please confirm any data provided with the related suppliers or authors. We do not provide medical advice, if you search for medical information you must always consult a medical professional before acting on any information provided.

Your questions, but not your email details will be shared with OpenAI and retained for 30 days in accordance with their privacy principles.

Please do not ask questions that use sensitive or confidential information.

Read the full Terms & Conditions.

Provide Feedback